Two Post-doctoral in the Design of Photoresist Polymers Suitable for Extreme Ultraviolet Lithography

The Ober group at Cornell University is looking for up two post-doctoral associates with expertise in polymer chemistry to work on a project involving the design of photoresist polymers suitable for extreme ultraviolet lithography. At present we are looking into scissionable polymers for this next generation lithography.  Familiarity with photoresist chemistry, photoactive compounds and/or expertise in transition metal catalysis would be considered an asset. Those interested in applying for the position, please send your application letter, your resume and have two letters of recommendation forwarded to: cko3@cornell.edu.